AlCr Sputtering Target, High Quality, Monolithic, Planar, Cathodic ARC, PVD Coating, Thin Film Deposition, HIP, Powder Metallurgical, Magnetron AlCr Sputtering Targets Manufacturer And Supplier
ALUMINIUM CHROMIUM SPUTTERING TARGET
AlCrN coatings are widely used for tool coating, where outstanding high temperature wear resistance is needed and highest oxidation resistance is beneficial. Those properties can be even more pronounced by selective alloying with other elements. (Al, Cr)2O3 coatings have been introduced to the coating market quite recently. These new types of PVD coatings are intended to compete with Al2O3 coatings produced by CVD. As the PVD process is limited in temperature, the formation of pure alpha-aluminumoxide is not possible yet. The addition of Cr to the target material results in a growth of mixed (Al, Cr)2O3 in the preferred corundum structure.
Haohai Metal offers the full range of compositions of the AlCr sputtering targets and cathodes, with the highest purity, density and homogeneity. The powder metallurgical production routes allow us to introduce other additional elements for creating tailored coatings. Our AlCr sputtering targets and cathodes are particularly resistant to breakage and long-lasting, we can be your most reliable partner for AlCr target materials.
Haohai Metal's AlCr sputtering targets include rectangle sputtering targets, circular sputtering targets and cathodic targets.
Aluminium Chromium Planar (Rectangle, Circular) Sputtering Target
|Rectangle||Length (mm)||Width (mm)||Thickness (mm)||Custom Made|
|10 - 2000||10 - 600||1.0 - 25|
|Circular||Diameter (mm)||Thickness (mm)|
|10 - 400||1.0 - 25|
30/70, 50/50, 70/30,
|Purity||2N7 (99.7%), 3N (99.9%), 3.5N (99.95%)|
|Density||4.5 g/cm3 for 50/50 at%, 3.98 g/cm3 for 70/30 at%|
|Grain Sizes||< 80 micron or on request|
|Fabrication Processes||Powder Metallurgical, Hot Isostatic Pressing(HIP), Machining|
|Shape||Plate, Disc, Step, Down bolting, Threading, Custom Made|
|Type||Monolithic, Multi-segmented Target, Bonding|
|Surface||Ra 1.6 micron or on request|
✦ We make sure the same grain direction in the multi-segmented construction parts.
✦ Flatness, clean surface, polished, free of crack, oil, dot, etc.
✦ High ductility, high thermal conductivity, homogeneous microstructure and high purity etc.
Aluminium Chromium Arc Cathodes
We supply Alunimium Chromium planar arc cathodes as well as Alunimium Chromium planar sputtering targets
For our Aluminium Chromium Sputtering Targets and Arc Cathodes
Acc. to drawings or request.
Impurities Content [wt%]
|Aluminium Chromium Purity [%]||Elements|
70/30 at%, 3N
|Metallic Impurities [μg/g]||Al||54.465|
|Non-Metallic Impurities [μg/g]||C||0.015|
|Guaranteed Density [g/cm3]||3.98|
|Grain Size [μm]||80|
|Thermal Conductivity [W/(m.K)]||-|
|Coefficient of thermal expansion [1/K]||-|
1. Metallic elements were analyzed using GDMS (Precision and bias typical of GDMS measurements are discussed under ASTM F1593).
2. Gas elements were analyzed using LECO GAS ANALYZER .
✦ C,S determined by Combustion-lR
✦ N,H determined by IGF-TC
✦ O determined by IGF-NDIR
✦ Solar Photovoltaic
✦ Flat Panel Displats
✦ Wear Resistant Coating
Haohai Metal (Haohai Titanium), equipped with professional factory, is one of the leading manufacturers and suppliers for various materials and sizes of sputtering targets. Our AlCr sputtering target, with high purity, include bonding or spayed (straight or dogbone) rotatable (rotary, cylindrical) targets, planar (rectangle, disc) targets, which are extensiely used in pvd coating for thin film deposition technology. Welcome to buy and wholesale our low price, high usage rates, high purity and high quality AlCr targets.