AZO Sputtering Target, High Quality, Bonding, Rotatable, Cylindrical, Straight, Planar, Cathodic ARC, PVD Coating, Thin Film Deposition, Magnetron AZO Sputtering Targets Manufacturer and Supplier
AZO SPUTTERING TARGET
It is well known that aluminum-doped ZnO (AZO) thin film has a high transmittance in the visible region, and a low resistivity, and its optical band gap can be controlled by Al content. AZO films have potential applications in solar cells, antistatic coatings, solid-state display devices, optical coatings, heaters, defrosters, etc. Comparing with indium oxide, ZnO has the advantage that raw materials are cheaper and non-toxic. Particularly, AZO film is more stable. Therefore, AZO is one of the best substitutes of ITO using as transparent conductive film (TCO).
Our Al-doped ZnO (AZO) target was prepared by hot pressing using ZnO and Al2O3 powder in mass ratio of 98:2 with high density, minimum pore distribution, low resistivity, homogeneous microstructure, fine grain sizes and excellent surface condition.
Haohai AZO Sputtering Targets include AZO rotary sputtering targets, AZO planar sputtering targets and AZO cathodic targets.
AZO Rotatable (Rotary, Cylindrical) Sputtering Target
Multi-segment assemblies bonded to a metal backing tube
✦ Inner diameter Standard 125 mm
Other diameters on request
✦ Segment thickness ≤22 mm
Standards 9, 14 and 18 mm
✦ Maximum length 4000 mm
✦ AZO-segment length ≤254 mm
✦ Segment gap 0.4 mm ± 0.15 mm
- AZO rotary targets are manufactured by bonding sintered AZO-segments to a metal backing tube using the most advanced technologies.
- Backing tubes for AZO targets are provided either by Haohai Metal or by the cusomer and can be re-used.
AZO Planar Sputtering Target
Multi-tiles assemblies bonded to metallic backing plate
✦ Length / tile ≤ 300 mm
✦ Width / tile ≤ 128 mm
✦ Thickness ≤ 22 mm
✦ Segment gap ± 03 mm ± 0.1 mm
✦ Tolerance for length,
Width, thickness ± 0.2 mm
✦ High density grade ≥5.30 g/cm3
✦ Electrical resistivity at 20 ℃ <1 mΩcm
✦ Appearance yellow / greenish
The physical data are based on AZO with a 98/2 wt% ratio and a thickness of 14 mm.
High purity Zno / Al2O3 in a 98/2 wt% or 99 / 1 wt% ratio and high purity i-ZnO.
Other ratios are available on request.
✦ Purity > 3N5
Picture 1 shows the homogeneous microstructure with an average grain size of 6 microns.
Picture 2 shows that the Al2O3 is in solid solution within the ZnO matrix: no Al2O3 phase.
The advantages of Haohai's AZO Target
✦ Optimum mechanical properties
Full density targets with greatly enhanced mechanical properties and improved plasma stability provide a uniform layer deposition.
✦ Improved target lifetime
Optimised grain sizes and homogeneous microstructure result in a desirable balance between mechanical and thermal properties, which enables uniform heat dispersion and avoids thermal stress, lengthening the target’s lifetime.
✦ High sputtering efficiency saves time and cost
Haohai’s high density AZO targets result in faster deposition rates, less sputtering time and lower production costs. High mechanical integrity with excellent thermal properties also allows more material to be sputtered from each target.
AZO is used for (pulsed) DC magnetron sputtering of transparent conductive oxide (TCO) layers with high refractive index on substrates such as glass, polymer and metal foils etc.
Thin films based on AZO are transparent, electrically conductive and are mainly applied in the thin film photovoltaic and architectural glass industries.
✦ Electronic dispalys
✦ Touchscreen panels
✦ Light-emitting diodes (LEDs)
✦ Photovoltaic cells
Haohai Metal (Haohai Titanium), equipped with professional factory, is one of the leading manufacturers and suppliers for various materials and sizes of sputtering targets. Our AZO sputtering target, with high purity, include bonding rotatable (rotary) targets, planar (rectangle, disc) targets, which are extensiely used in pvd coating for thin film deposition technology. Welcome to buy and wholesale our low price, high usage rates, high purity and high quality AZO targets.