Nickel Vanadium (Ni/V) Sputtering Target, Monolithic, Planar, Cathodic ARC, PVD Coating, Thin Film Deposition, Magnetron NiV7 Sputtering Targets Manufacturer And Supplier
NICKEL VANADIUM(Ni/V) SPUTTERING TARGET
Nickel plus 7wt% Vanadium (NiV7) is one of the most important thin film sputtering alloy in the field of Semiconductors. It features the desirable chemical, electrical and optical properties of pure Ni, with the added advantage to be not ferromagnetic. Because of the non-ferromagnetic property, it is easy to use in high-rate magnetron sputtering equipment. NiV7 coatings applications include resistive films, diffusion barriers, and prewetting layers for advanced packaging, e.g. Flip-Chip technology etc.
Haohai Metal, as one of the top leading manufacturer of coating materials for physical vapor deposition (PVD) coating industry more than 15 years, with well-equipped modem plant and rich experience, our sputtering targets and evaporation materials won high reputation in worldwide.
Haohai Metal's NiV sputtering targets include rectangle sputtering targets, circular sputtering targets and cathodic targets.
Nickel Vanadium Planar (Rectangle, Circular) Sputtering Target
10 - 2000
10 - 600
1.0 - 25
10 - 400
1.0 - 25
3N (99.9%), 3.5N (99.95%)
< 80 micron or on request
Vacuum Melted, Casting, Machining
Plate, Disc, Step, Down bolting, Threading, Custom Made
Monolithic, Multi-segmented Target, Bonding
Ra 1.6 micron or on request
✦ We make sure the same grain direction in the multi-segmented construction parts.
✦ Flatness, clean surface, polished, free of crack, oil, dot, etc.
✦ High ductility, high thermal conductivity, homogeneous microstructure and high purity etc.
Nickel Vanadium Arc Cathodes
We supply Nickel Vanadium planar arc cathodes as well as Nickel Vanadium planar sputtering targets
For our Nickel Vanadium Sputtering Targets and Arc Cathodes
✦ Vanadium content is held at +0.5 / -0.3 wt%.
✦ The vanadiu is 100% atomically solved within the nickel matrix, this guarantees non ferromagnetic properties and excellent sputtering performance.
✦ Others could be acc. to drawings or request.
Impurities Content [ppm]
Nickel Vanadium Purity [%]
93/7 wt%, 3N5
Metallic Impurities [μg/g]
Non-Metallic Impurities [μg/g]
Guaranteed Density [g/cm3]
Grain Size [μm]
Thermal Conductivity [W/(m.K)]
Coefficient of thermal expansion [1/K]
1. Metallic elements were analyzed using GDMS (Precision and bias typical of GDMS measurements are discussed under ASTM F1593).
2. Gas elements were analyzed using LECO GAS ANALYZER .
✦ C,S determined by Combustion-lR
✦ N,H determined by IGF-TC
✦ O determined by IGF-NDIR
✦ X-ray Fluorescence Spectrometry (XRF)
✦ Matallographic investigation
✦ Solar & Photovoltaic Industry