Nickel Vanadium (Ni/V) Sputtering Target, Monolithic, Planar, Cathodic Arc, PVD Coating, Thin Film Deposition, Magnetron NiV7 Sputtering Targets Manufacturer And Supplier

Nickel plus 7wt% Vanadium (NiV7) is one of the most important thin film sputtering alloy in the field of Semiconductors. It features the desirable chemical, electrical and optical properties of pure Ni, with the added advantage to be not ferromagnetic. Because of the non-ferromagnetic property, it is easy to use in high-rate magnetron sputtering equipment. NiV7 coatings applications include resistive films, diffusion barriers, and prewetting layers for advanced packaging, e.g. Flip-Chip technology etc. Haohai Metal, as one of the top leading manufacturer of coating materials for physical vapor deposition (PVD) coating industry more than 15 years, with well-equipped modem plant and rich experience, our sputtering targets and evaporation materials won high reputation in worldwide.

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Product Details

Nickel Vanadium (Ni/V) Sputtering Target, Monolithic, Planar, Cathodic ARC, PVD Coating, Thin Film Deposition, Magnetron NiV7 Sputtering Targets Manufacturer And Supplier


NICKEL VANADIUM(Ni/V) SPUTTERING TARGET


Nickel plus 7wt% Vanadium (NiV7) is one of the most important thin film sputtering alloy in the field of Semiconductors. It features the desirable chemical, electrical and optical properties of pure Ni, with the added advantage to be not ferromagnetic. Because of the non-ferromagnetic property, it is easy to use in high-rate magnetron sputtering equipment. NiV7 coatings applications include resistive films, diffusion barriers, and prewetting layers for advanced packaging, e.g. Flip-Chip technology etc.

 

Haohai Metal, as one of the top leading manufacturer of coating materials for physical vapor deposition (PVD) coating industry more than 15 years, with well-equipped modem plant and rich experience, our sputtering targets and evaporation materials won high reputation in worldwide.


Haohai Metal's NiV sputtering targets include rectangle sputtering targets, circular sputtering targets and cathodic targets.




Nickel Vanadium Planar (Rectangle, Circular) Sputtering Target


Manufacturing Range

Rectangle

Length (mm)

Width (mm)

Thickness (mm)

Custom Made

10 - 2000

10 - 600

1.0 - 25

Circular

Diameter (mm)


Thickness (mm)

10 - 400


1.0 - 25

 

Specification

Composition [wt%]

NiV, 93/7

Purity

3N (99.9%), 3.5N (99.95%)

Density

8.90 g/cm

Grain Sizes

< 80 micron or on request

Fabrication Processes

Vacuum Melted, Casting, Machining

Shape

Plate, Disc, Step, Down bolting, Threading, Custom Made

Type

Monolithic, Multi-segmented Target, Bonding

Surface

Ra 1.6 micron or on request

 

Other Specifications

 We make sure the same grain direction in the multi-segmented construction parts.

 Flatness, clean surface, polished, free of crack, oil, dot, etc.

 High ductility, high thermal conductivity, homogeneous microstructure and high purity etc.




Nickel Vanadium Arc Cathodes

We supply Nickel Vanadium planar arc cathodes as well as Nickel Vanadium planar sputtering targets




For our Nickel Vanadium Sputtering Targets and Arc Cathodes


Tolerance 

✦ Vanadium content is held at +0.5 / -0.3 wt%.

✦ The vanadiu is 100% atomically solved within the nickel matrix, this guarantees non ferromagnetic properties and excellent sputtering performance.

✦ Others could be acc. to drawings or request.


Impurities Content [ppm]

Nickel Vanadium Purity [%]

Elements

93/7 wt%, 3N5

[99.95]

Metallic Impurities [μg/g]

Ag

5

Al

100
Ca1
Co75
Cr45
Cu15
Fe75
K
1
Li1
Mg50
Mn5

Mo

75

Na

1

Si

200

Ti

50

Non-Metallic Impurities [μg/g]

C

20

N

50
O200

S

5

Guaranteed Density [g/cm3]

8.90

Grain Size [μm]

80

Thermal Conductivity [W/(m.K)]

-

Coefficient of thermal expansion [1/K]

-


Analytical Methods: 

1. Metallic elements were analyzed using GDMS (Precision and bias typical of GDMS measurements are discussed under ASTM F1593). 

2. Gas elements were analyzed using LECO GAS ANALYZER .                                              

✦ C,S determined by Combustion-lR

✦ N,H determined by IGF-TC

✦ O determined by IGF-NDIR    

✦ X-ray Fluorescence Spectrometry (XRF)

✦ Matallographic investigation


Application

✦ Solar & Photovoltaic Industry

✦ Semiconductors


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