Hafnium Sputtering Targets, High Purity, Monolithic, Planar, Cathodic ARC, PVD Coating, Thin Film Deposition, Magnetron HF Sputtering Targets Manufacturer and Supplier

Haohai hafnium sputtering target is made from refined crystal bar which ensures low zirconium content, high purity and high reliability, are widely used in semiconductors thin film coating.

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Product Details

Hafnium Sputtering Targets, High Purity, Monolithic, Planar, Cathodic ARC, PVD Coating, Thin Film Deposition, Magnetron HF Sputtering Targets Manufacturer and Supplier


HAFNIUM SPUTTERING TARGET

 

Hafnium-based thin films made from Haohai Hafnium (Hf) sputtering target, are used as an insulator in the newer generations of semiconductors. The thin film prevents copper diffusion into silicon. Amorphous hafnium oxide has a high dielectric constant, it allows reduction of the gate leakage current and improves performance of the electronics.

 

Our hafnium sputtering target is made from refined crystal bar which ensures low zirconium content, high purity and high reliability.

 

Haohai Hafnium (Hf) Sputtering Targets include Hafnium planar sputtering targets.




Hafnium Planar (rectangle, circular) sputtering target

 

Manufacturing Range

RectangleLength (mm)Width (mm)Thickness (mm)Custom Made
10 - 150010 - 4005.0 - 40
CircularDiameter (mm)
Thickness (mm)
5.0 - 400
5.0 - 40


Specification

CompositionHf
Purity3N5 (99.95%)
Density13.31 g/cm3
Grain Sizes< 150 micron or on request
Fabrication ProcessesVacuum Melting, Machining
ShapeMonolithic Plate, Multi-segmented Target
TypesPlate, Disc, Step, Down bolting, Threading, Custom Made
SurfaceRa 1.6 micron


Other Specifications

 Flatness, clean smooth surface, polished, free of crack, oil, dot, etc.

 Excellent conductions, small linear expansion coefficient and good heat-resistance.

  



For our Hafnium sputtering targets

 

Tolerance

Acc. to drawings or on request.


Impurities Content [ppm] 

Hafnium Content [ppm]     
Hf
Purity [%]
99.95
Metallic Impurities [ppm]Al25
B0.5
Bi1
Cd2.5
Cr30
Co5
Fe95
Mg2
Mn20
Mo10
Nb50
Ni25
Si25
Ti20
W20
Zr5
Non-Metallic Impurities [ppm]C
20
N5
O50
P10
Guaranteed Density [g/cm3]13.3
Grain Size [μm]15


Application

Wear Resistant Coating

 Decorative Coating

 Optical Coating

 Semiconductors




Haohai Metal (Haohai Titanium), equipped with professional factory, is one of the leading manufacturers and suppliers for various materials and sizes of sputtering targets and arc cathodes. Our Hafnium sputtering target, with high purity, include planar (rectangle, disc) targets, and arc cathodes, which are extensiely used in pvd coating for thin film deposition technology. Welcome to buy and wholesale our low price, high usage rates, high purity and high quality hafnium targets.

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