Silicon Sputtering Targets, High Purity, Monolithic, Planar, Disc, N-type Doping, Bonding, PVD Coating, Thin Film Deposition, Magnetron Si Sputtering Targets Manufacturer and Supplier
SILICON SPUTTERING TARGET
Haohai offers Silicon Sputter Target, Boron doped Silicon Sputter Target for thin film and coating applications such as Optical, large area glass coating (Low-E) for architecture, automotive glass, touch panel glass (AR).
Haohai Silicon Sputtering Targets include Silicon Rotatable sputtering targets and Silicon planar sputtering targets.
Silicon Rotatable (Rotary, Cylindrical) Sputtering Target
|OD (mm)||ID (mm)||Length (mm)||Custom Made|
|80 - 160||60 - 125||100 - 4000|
|Grain Sizes||< 150 micron or on request|
|Fabrication Processes||Casting, HPS, Plasma Spraying, Machining|
|Shape||Straight, Dog bone|
SCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove,
Custom Made for SS Backing Tube
|Surface||Ra 1.6 micron|
✦ Vapor degreased and demagnetized after final machining.
✦ ID to be HONED and OD GROUND after raw tube is produced to ensure ID to OD concentricity meets drawing requirements.
✦ High vacuum tight, leak rate at any location not to exceed 1 x 10-8 STD CC/SEC.
✦ Sealed in plastic, wrapped in foam to protect, and ends capped to protect seal surfaces.
Silicon Planar (Rectangle, Circular) Sputtering Target
|Rectangle||Length (mm)||Width (mm)||Thickness (mm)||Custom Made|
|10 - 2000||10 - 300||3.175 - 20|
|Circular||Diameter (mm)||Thickness (mm)|
|5.0 - 300||3.175 - 20|
|Composition||Si (Boron doped)|
|Purity||3N (99.9%), 4N (99.99%), 5N (99.999%)|
|Grain Sizes||< 100 micron or on request|
|Fabrication Processes||Casting, Machining, Bonding|
|Shape||Multi-segmented Target, Bonding on Cu Backing plate|
|Types||Plate, Disc, Step, Down bolting, Threading, Custom Made|
|Surface||Ra 1.6 micron|
Flatness, clean smooth surface, polished, free of crack, oil, dot, etc.
Excellent conductions, small linear expansion coefficient and good heat-resistance.
For Haohai Silicon sputtering targets
Acc. to drawings or on request.
Production of sputtering targets from undoped or Boron doped Silicon includes CZ growth of ingots with annealing, material analysis, cutting and machining.
Backing plates and Bonding service
Haohai provide many standard OFHC Copper backing plates for commercially available sputtering and cathodic arc deposition systems, as well as custom designs. Both Metallic and Epoxy Bonding of Silicon tiles is available.
Impurities Content [ppm]
|Silicon Content [ppm]||Si|
|Metallic Impurities [ppm]||Al||500|
|Non-Metallic Impurities [ppm]||N||300|
|Resistivity [ohm.cm] 20℃||< 20|
|Guaranteed Density [g/cm3]||2.2|
|Grain Size [μm]||150|
✦ Large Area Glass Coating
✦ Display Industry
✦ Optical Coating
✦ Solar & Photovoltaic Industry
Haohai Metal (Haohai Titanium), equipped with professional factory, is one of the leading manufacturers and suppliers for various materials and sizes of sputtering targets. Our silicon sputtering target, with high purity, include spayed or bonding rotatable (rotary, cylindrical) targets, planar (rectangle, disc) targets, which are extensiely used in pvd coating for thin film deposition technology. Welcome to buy and wholesale our low price, high usage rates, high purity and high quality silicon targets.