Tantalum Sputtering Target, High Purity, Monolithic, Planar, Cathodic ARC, PVD Coating, Thin Film Deposition, Magnetron Ta Sputtering Targets Manufacturer and Supplier

Haohai tantalum sputtering targets are characterized by their uniform, high density microstructure and controlled texture, which promotes uniform sputtering rates and generally superior sputtering behavior, earn very good reputation all over the world.

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Product Details

Tantalum Sputtering Target, High Purity, Monolithic, Planar, Cathodic ARC, PVD Coating, Thin Film Deposition, Magnetron Ta Sputtering Targets Manufacturer and Supplier


TANTALUM SPUTTERING TARGET


Tantalum sputtering targets make thin coatings via a sputtering process for copper interconnect metallization, magnetic recording media, printer components, flat panel displays, optical and industrial glass, and thin film resistors.

 

Haohai tantalum sputtering targets are characterized by their uniform, high density microstructure and controlled texture, which promotes uniform sputtering rates and generally superior sputtering behavior, earn very good reputation all over the world.

 

Haohai tantalum sputtering targets include tantalum monolithic rotatable sputtering targets, tantalum planar sputtering targets and tantalum cathodic targets.



 

Tantalum Monolithic Cylindrical (Rotary, Rotatable) Sputtering Target

 

Manufacturing Range

OD (mm)

ID (mm)

Length (mm)

Custom made

50 - 300

30 - 280

100 - 3000


Specification

Composition

Ta

Purity

3.5N (99.95%),4N (99.99%), 4.5N (99.995%)

Density

16.6 g/cm3

Grain Sizes

< 80 micron or on request

Fabrication Processes

Electron beam (EB) melting, Forging, Extruding, Machining

Shape

Straight, Dog Bone

End Types

SCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove, Custom Made

Surface

Ra 1.6 micron or on request

 

Other Specification

✦ Vapor degreased and demagnetized after final machining

✦ ID to be HONED and OD GROUND after raw tube is produced to ensure ID to OD concentricity meets drawing requirements.

✦ High vacuum tight, leak rate at any location not to exceed 1 x 10-8 STD CC/SEC.

✦ Sealed in plastic, wrapped in foam to protect, and ends capped to protect seal surfaces


Normal Sizes

Tantalum Rotary 

Sputtering Target

Normal Sizes

  55mm ID x   70mm OD x 1334mm Long

  80mm ID x 100mm OD x                Long

125mm ID x 153mm OD x   576mm Long

125mm ID x 153mm OD x   800mm Long

125mm ID x 153mm OD x   895mm Long

125mm ID x 155mm OD x   895mm Long

125mm ID x 153mm OD x 1172mm Long

125mm ID x 153mm OD x 1676mm Long

125mm ID x 153mm OD x 1940mm Long

125mm ID x 153mm OD x 1994mm Long

125mm ID x 153mm OD x 2420mm Long

125mm ID x 153mm OD x 3191mm Long

125mm ID x 153mm OD x 3852mm Long

125mm ID x 153mm OD x                Long

125mm ID x 180mm OD x   624mm Long

194mm ID x 219mm OD x 2301mm Long




 

Tantalum Planar (Rectangle, Circular) Sputtering Target

 

Manufacturing Range

Rectangle

Length (mm)

Width (mm)

Thickness (mm)

Custom Made

10 - 2000

10 - 800

1.0 - 25

Circular

Diameter (mm)


Thickness (mm)

10 - 1000


1.0 - 50


Specification

Composition

Ta

Purity

3.5N (99.95%), 4N (99.99%),4.5N (99.995%)

Density

16.6 g/cm3

Grain Sizes

< 80 micron or on request

Fabrication Processes

Electron beam (EB) melting, Forging, Rolling, Machining

Shape

Plate, Disc, Step, Custom Made

Types

Monolithic, Multi-segmented Target

Surface

Ra 1.6 micron or on request

 

Other Specifications

We make sure the same grain direction in the multi-segmented construction parts.

Flatness, clean surface, polished, free of crack, oil, dot, etc.




Tantalum arc cathodes

We supply Tantalum rotary and planar arc cathodes as well as rotary and planar sputtering targets





For our Tantalum Sputtering Target and Arc Cathodes


Tolerance 

Acc. to drawings or on request.


There is a choice of purity levels with different prices and availability. Purity is measured by DC Plasma and gasses are measured by LECO analyzers. More detailed testing by GDMS (Glow Discharge Mass Spectrometry) is available.


Impurities Content [ppm]

Purity [%]

Elements

3N5

[99.95]

4N

[99.99]

4N5

[99.995]

Metallic Impurities [μg/g]

Al

10

1

0.5

Ca

10

1

1

Cl

3

1

1

Co

10

1

0.5

Cr

10

1

0.5

Cu

5

1

0.5

Fe

50

5

1

K

2

0.4

0.1

Li

1

0.5

0.05

Mg

10

1

0.5

Mn

10

1

0.5

Mo

50

10

10

Na

1

0.4

0.4

Nb

300

100

50

Ni

20

5

1

Pb

5

1

1

Si

10

1

0.5

Sn

10

1

1

Ti

10

1

1

V

5

1

1

W

150

80

50

Zn

5

1

1

Zr

20

5

1

Non-Metallic Impurities [μg/g]

C

40

30

30

O

100

80

80

H

10

10

5

N

40

20

20

S

10

5

1

Guaranteed Density [g/cm3]

16.6

16.6

16.6

Grain Size [μm]

100

100

100

Thermal Conductivity [W/(m.K)]

max.60

max.60

max.60

Coefficient of thermal expansion [1/K]

6.3-6

6.3-6

6.3-6

 

Application

 Large Area Glass Coating

 Wear Resistant Coating

 Optical Coating

 Semi-conductive

  


Haohai Metal (Haohai Titanium), equipped with professional factory, is one of the leading manufacturers and suppliers for various materials and sizes of sputtering targets and arc cathodes. Our tantalum sputtering target, with high purity, include monolithic rotatable (rotary, cylindrical) targets, planar (rectangle, disc) targets, and arc cathodes, which are extensiely used in pvd coating for thin film deposition technology. Welcome to buy and wholesale our low price, high usage rates, high purity and high quality tantalum targets.

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