Vanadium Sputtering Target, High Purity, Monolithic, Rotatable, Rotary, Cylindrical, Planar, Cathodic Arc, PVD Coating, Thin Film Deposition, Magnetron V Sputtering Targets

Haohai is specializes in producing high purity Vanadium Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, physical vapor deposition (PVD) display and optical applications. Our Vanadium Sputtering Targets for thin film are available monoblock rotary, planar targets or bonded with planar targets with different shapes and dimensions.

Chat Now

Product Details

Vanadium Sputtering Target, High Quality, Monolithic, Column, Rotary, Cylindrical, Planar, Cathodic ARC, PVD Coating, Thin Film Deposition, Magnetron V Sputtering Targets Manufacturer and Vendor


VANADIUM SPUTTERING TARGET


Vanadium is a soft and ductile, silver-grey metal. It has good resistance to corrosion by alkalis, sulfuric and hydrochloric acid. It oxidizes readily at about 933 K (660 C). Vanadium has good structural strength and a low fission neutron cross section, making it useful in nuclear applications. Although a metal, it shares with chromium and manganese the property of having valency oxides with acid properties.

 

Haohai is specializes in producing high purity Vanadium Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, physical vapor deposition (PVD) display and optical applications. Our Vanadium Sputtering Targets for thin film are available monoblock rotary, planar targets or bonded with planar targets with different shapes and dimensions.

 

Haohai vanadium sputtering targets include vanadium monolithic rotatable sputtering targets, vanadium planar sputtering targets and vanadium cathodic targets.




Vanadium Rotary (Rotatable, Cylindrical) Sputtering Target


Manufacturing Range

OD (mm)

ID (mm)

Length (mm)

Custom Made

50 - 300

30 - 280

100 - 4000


Specification

Composition

V

Purity

2N5 (99.5%), 2N7 (99.7%), 3N (99.9%), 3N5 (99.95%), 4N (99.99%)

Density

6.11 g/cm3

Grain Sizes

< 80 micron or on request

Fabrication Processes

Vacuum Melting, forging, extruding, Machining, Bonding

Shape

Straight, Dog bone

End Types

SCI, SRF, DSF, RFF, WFF, VA, Beakert, GPI Ends Fixation, Spiral Groove, 

Custom Made

Surface

Ra 1.6 micron


Other Specification

 Vapor degreased and demagnetized after final machining

 ID to be HONED and OD GROUND after raw tube is produced to ensure ID to OD concentricity meets drawing requirements.

 High vacuum tight, leak rate at any location not to exceed 1 x 10-8 STD CC/SEC.

 Sealed in plastic, wrapped in foam to protect, and ends capped to protect seal surfaces


Normal Sizes

Vanadium Rotary 

Sputtering Target

Normal Sizes

  80mm ID x 100mm OD x                Long

125mm ID x 153mm OD x   895mm Long

125mm ID x 153mm OD x 1172mm Long

125mm ID x 153mm OD x 1290mm Long

125mm ID x 153mm OD x 1676mm Long

125mm ID x 153mm OD x 1940mm Long

125mm ID x 153mm OD x 2420mm Long

125mm ID x 153mm OD x 3191mm Long

125mm ID x 153mm OD x 3852mm Long


Compared to titanium planar configurations, Haohai titanium cylindrical sputtering targets offer:

 Larger erosion zones that provide 2 to 2.5 times the material utilization.

 Longer target life that reduces the frequency of downtime for changeouts and chamber maintenance.

 Custom manufacturing in monolithic, segmented or thermal spray formats.

 End features that are precision machined for individual cathode system designs.

 Reduce the cost of ownership for large area coating operations.

 Variety of materials including.

 Optimum grain size and uniform microstructure assure consistent process performance through full end of life.

 Complete homogeneity and high purity levels produce consistent coverage.

 Able to supply materials to any size operation from R&D to full-scale production.




Vanadium Planar (Rectangle, Circular) Sputtering Target


Manufacturing Range

Rectangle

Length (mm)

Width (mm)

Thickness (mm)

Custom Made

10 - 2000

10 - 600

1.0 - 25

Circular

Diameter (mm)


Thickness (mm)

10 - 400


1.0 - 25

 

Specification

Composition

V

Purity

2N5 (99.5%), 3N (99.9%), 3.5N (99.95%), 4N (99.99%)

Density

6.11 g/cm3

Grain Sizes

< 80 micron or on request

Fabrication Processes

Vacuum Melting, Forging, Rolling, Machining

Shape

Plate, Disc, Step, Down bolting, Threading, Custom Made

Type

Monolithic, Multi-segmented Target, Bonding

Surface

Ra 1.6 micron or on request

 

Other Specifications

 We make sure the same grain direction in the multi-segmented construction parts.

 Flatness, clean surface, polished, free of crack, oil, dot, etc.




Vanadium Arc Cathodes

We supply vanadium rotary and planar arc cathodes as well as vanadium rotary and planar sputtering targets




For our Vanadium Sputtering Target and Arc Cathodes


Tolerance 

Acc. to drawings or request.


Impurities Content [ppm]

Vanadium Purity [%]

Elements

2N5

[99.5]

3N5

[99.95]

Metallic Impurities [μg/g]

Al

350

50

Ca

200

50

Cr

100

50

Cu

50

50

Fe

800

200

Mo

500

130

NI

300

50

Si

800

150

Sn

100

30

Ti

250

150

Non-Metallic Impurities [μg/g]

C

150

50

O

400

200

H

30

20

N

200

50

Guaranteed Density [g/cm3]

6.11

6.11

Grain Size [μm]

80

80

Thermal Conductivity [W/(m.K)]

30.7

30.7

Coefficient of thermal expansion [1/K]

8.4-6

8.4-6


Analytical Methods: 

1. Metallic elements were analyzed using GDMS (Precision and bias typical of GDMS measurements are discussed under ASTM F1593). 

2. Gas elements were analyzed using LECO GAS ANALYZER .                                              

 C,S determined by Combustion-lR

 N,H determined by IGF-TC

 O determined by IGF-NDIR    


Application

 Large Area Glass Coating

 Electronics industry

 Wear Resistant Coating

 Decorative Coating



Haohai Metal (Haohai Titanium), equipped with professional factory, is one of the leading manufacturers and suppliers for various materials and sizes of sputtering targets and arc cathodes. Our vanadium sputtering target, with high purity, include monolithic rotary (column, cylindrical) targets, planar (rectangle) targets, and arc cathodes, which are extensiely used in pvd coating for thin film deposition technology. Welcome to buy and wholesale our low price, high usage rates, high purity and high quality targets.


Previous:AlCr Sputtering Target, High Quality, Monolithic, Planar, Cathodic ARC, PVD Coating, Thin Film Deposition, HIP, Powder Metallurgical, Magnetron AlCr Sputtering Targets Manufacturer And Supplier Next:SiOx Sputtering Target, High Quality, Rotatable, Straight, Dogbone, Planar, PVD Coating, Thin Film Deposition, Magnetron SiOx Sputtering Targets Manufacturer and Supplier

Inquiry