Zirconium Sputtering Target, High Quality, Monolithic, Column, Rotary, Cylindrical, Planar, Cathodic ARC, PVD Coating, Thin Film Deposition, Magnetron Zr Sputtering Targets Manufacturer and Vendor
ZIRCONIUM (Zr) SPUTTERING TARGET
As well as titanium products, zirconium is a main products of Haohai, we focus on zirconium materials and its application for a long time. Haohai zirconium sputtering target and arc cathodes are well known and extensively used in PVD coating field because of the high purity, fine grain sizes, homogeneous microstructure, excellent surface condition and accurate dimensions.
Haohai zirconium sputtering target include ziconium monolithic rotary sputtering target, zirconium planar sputtering target and arc cathodic target.
Zirconium Monolithic Rotary (Rotatable, Cylindrical) Sputtering Target
50 - 300
30 - 280
100 - 4000
R60702, 3N (99.9%), 3N5 (99.95%), 4N (99.99%)
< 80 micron or on request
Vacuum Melting, Forging, Extruding, Machining
Straight, Dog bone
SCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove, Custom Made
Ra 1.6 micron
✦ Vapor degreased and demagnetized after final machining
✦ ID to be HONED and OD GROUND after raw tube is produced to ensure ID to OD concentricity meets drawing requirements.
✦ High vacuum tight, leak rate at any location not to exceed 1 x 10-8 STD CC/SEC.
✦ Sealed in plastic, wrapped in foam to protect, and ends capped to protect seal surfaces
55mm ID x 70mm OD x 1334mm Long
80mm ID x 100mm OD x Long
125mm ID x 153mm OD x 576mm Long
125mm ID x 153mm OD x 800mm Long
125mm ID x 153mm OD x 895mm Long
125mm ID x 155mm OD x 895mm Long
125mm ID x 153mm OD x 1172mm Long
125mm ID x 153mm OD x 1676mm Long
125mm ID x 153mm OD x 1940mm Long
125mm ID x 153mm OD x 1994mm Long
125mm ID x 153mm OD x 2420mm Long
125mm ID x 153mm OD x 3191mm Long
125mm ID x 153mm OD x 3852mm Long
125mm ID x 153mm OD x Long
125mm ID x 180mm OD x 624mm Long
194mm ID x 219mm OD x 2301mm Long
Compared to planar configurations, Haohai cylindrical sputtering target offer:
✦ Larger erosion zones that provide 2 to 2.5 times the material utilization
✦ Longer target life that reduces the frequency of downtime for changeouts and chamber maintenance
✦ Custom manufacturing in monolithic, segmented or thermal spray formats
✦ End features that are precision machined for individual cathode system designs
✦ Reduce the cost of ownership for large area coating operations
✦ Variety of materials including
✦ Optimum grain size and uniform microstructure assure consistent process performance through full end of life
✦ Complete homogeneity and high purity levels produce consistent coverage
✦ Able to supply materials to any size operation from R&D to full-scale production
Zirconium Planar (rectangle, circular) Sputtering Target
10 - 2000
10 - 1200
1.0 - 50.8
10 - 1000
1.0 - 100
R60702, 3N (99.9%), 3.5N (99.95%), 4N (99.99%), 4.5N (99.995%)
< 80 micron or on request
Vacuum melting, Forging, rolling, Machining
Plate, Disc, Step, Custom Made
Monolithic, Multi-Segmented Target
Ra 1.6 micron
Rolled plates, per ASTM B551
For rectangle targets, we cut big plates into sizes by water jet, to make sure the composition, mechanical properties and the grain structure of every part in the same batch is homogeneous and consistent. We can supply the layout of the master plate, our customer can trace the position of every part by our marking system.
Rolled bars, per ASTM B550
For the circular targets, we cut long bars into sizes by wire-electrode cutting, to make sure the composition, mechanical properties and the grain structure of every part in the same batch is homogeneous and consistent, we can supply the layout of the master bar, our customer can trace the position of every part by our marking system.
We make sure the same grain direction in the multi-segmented construction parts.
Flatness, clean surface, polished, free of crack, oil, dot, etc.
Zirconium Arc Cathodes
We supply rotary and planar arc cathodes as well as rotary and planar sputtering targets
For our Zirconium Sputtering Target and Arc Cathodes
Acc. to drawings or on request.
Impurities Content (wt%/ppm)
Zirconium Content [wt%]
Zr 702 (wt%)
Metallic Impurities [μg/g]
Non-Metallic Impurities [μg/g]
Guaranteed Density [g/cm3]
Grain Size [μm]
Thermal Conductivity [W/(m·K)]
Coefficient of Thermal Expansion [1/K]
Concentrations of other metal elements are too low to be determined.
✦ Large Area Glass Coating (Low-E, Automotive)
✦ Wear Resistant Coating
✦ Decorative Coating
✦ Optical Coating
Haohai Metal (Haohai Titanium), equipped with professional factory, is one of the leading manufacturers and suppliers for various materials and sizes of sputtering targets and arc cathodes. Our zirconium sputtering target, with high purity, include monolithic rotary (column, cylindrical) targets, planar (rectangle) targets, and arc cathodes, which are extensiely used in pvd coating for thin film deposition technology. Welcome to buy and wholesale our low price, high usage rates, high purity and high quality targets.