Help you interpret metal sputtering targets
What is a metal sputtering target?
The coated metal sputtering target is a sputtering source that is sputtered on a substrate to form various functional films by magnetron sputtering, multi-arc ion plating or other types of coating systems under suitable process conditions.
Classification of sputtering targets
According to the different materials can be divided into: metal target, ceramic target, alloy target
According to the application of different directions can be divided into: semiconductor related target, magnetic recording target, optical recording target, display target, other application target
According to the different shapes can be divided into: circular and rectangular targets
Sino-Austrian new materials specializing in the provision of metal, ceramics, alloys and other targets, conventional size of the spot, non-conventional size can be customized processing.
Application of metal sputtering target
Metal sputtering target applications are widely used, including magnetic recording coating, flat display coating, semiconductor coating, solar cell coating, decorative coating, mold coating, glass coating, electronic device coating, in addition, can also be used for printing , Cosmetics, medicine, steel smelting, automotive optoelectronics and so on.