SiOx Sputtering Target, High Quality, Rotatable, Straight, Dogbone, Planar, PVD Coating, Thin Film Deposition, Magnetron SiOx Sputtering Targets Manufacturer and Supplier

Haohai Titanium specializes in producing high purity Silicon oxide sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

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SiOx Sputtering Target, High Quality, Rotatable, Straight, Dogbone, Planar, PVD Coating, Thin Film Deposition, Magnetron SiOx Sputtering Targets Manufacturer and Supplier


SILICON OXIDE(SiO2) SPUTTERING TARGET


Haohai Titanium specializes in producing high purity Silicon oxide sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

 

Haohai Silicon Oxide (SiO2) Sputtering Targets include Silicon Oxide (SiO2) rotary sputtering targets and Silicon Oxide (SiO2) planar sputtering targets.

 


 

Silicon Oxide (SiO2) Rotatable (Rotary, Cylindrical) Sputtering Target

 

Manufacturing Range

OD (mm)

ID (mm)

Length (mm)

Custom Made

80 - 160

60 - 125

100 - 4000

 

Specification

Composition

SiO2

Purity

3N (99.9%), 3N5 (99.95%), 4N (99.99%), 4N5 (99.995%)

Density

2.3 g/cm3

Grain Sizes

< 150 micron or on request

Fabrication Processes

Plasma Spraying, Machining, Bonding

Shape

Straight, Dog bone

End Types

SCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove, Custom Made for SS Backing Tube

Surface

Ra 1.6 micron

 

Other Specification

 Vapor degreased and demagnetized after final machining.

 ID to be HONED and OD GROUND after raw tube is produced to ensure ID to OD concentricity meets drawing requirements.

 High vacuum tight, leak rate at any location not to exceed 1 x 10-8 STD CC/SEC.

 Sealed in plastic, wrapped in foam to protect, and ends capped to protect seal surfaces.

 


  

Silicon Oxide (SiO2) Planar (Rectangle, Circular) Sputtering Target


Manufacturing Range

Rectangle

Length (mm)

Width (mm)

Thickness (mm)

Custom Made

10 - 2000

10 - 300

5.0 - 40

Circular

Diameter (mm)


Thickness (mm)

5.0 - 200


5.0 - 20


Specification

Composition

SiO2

Purity

3N (99.9%), 3N5 (99.95%), 4N (99.99%), 4N5 (99.995%)

Density

2.3 g/cm3

Grain  Sizes

< 150 micron or on request

Fabrication Processes

Machining, Bonding

Shape

Multi-segmented Target, Bonding on Cu Backing plate

Types

Plate, Disc, Step, Down bolting, Threading, Custom Made

Surface

Ra 1.6 micron

 

Other Specifications

Flatness, clean smooth surface, polished, free of crack, oil, dot, etc.

Excellent conductions, small linear expansion coefficient and good heat-resistance.

 


 

For Haohai Silicon Oxide (SiO2) sputtering targets

 

Tolerance

Acc. to drawings or on request.

 

Application

Optical Coating

 Solar & Photovoltaic Coating




Haohai Metal (Haohai Titanium), equipped with professional factory, is one of the leading manufacturers and suppliers for various materials and sizes of sputtering targets. Our SiOx sputtering target, with high purity, include bonding or spayed (straight or dogbone) rotatable (rotary, cylindrical) targets, planar (rectangle, disc) targets, which are extensiely used in pvd coating for thin film deposition technology. Welcome to buy and wholesale our low price, high usage rates, high purity and high quality SiOx targets.

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