TiOx Sputtering Target, High Quality, Rotatable, Straight, Dogbone, Planar, PVD Coating, Thin Film Deposition, Magnetron TiOx Sputtering Targets Manufacturer and Supplier

Haohai Titanium Oxide (TiOx) sputtering target with perfect density, high purity and very fine grain microstructure, smooth surface, no cracks, no chipping, no foreign inclusions and contaminants, are extensively used in optical glass AR thin film coating and large area glass coating (Low-E) manufacturing in the architectural glass industry.

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Product Details

TiOx Sputtering Target, High Quality, Rotatable, Straight, Dogbone, Planar, PVD Coating, Thin Film Deposition, Magnetron TiOx Sputtering Targets Manufacturer and Supplier


TITANIUM OXIDE (TiOx) SPUTTERING TARGET


Haohai Titanium Oxide (TiOx) sputtering target with perfect density, high purity and very fine grain microstructure, smooth surface, no cracks, no chipping, no foreign inclusions and contaminants, are extensively used in optical glass AR thin film coating and large area glass coating (Low-E) manufacturing in the architectural glass industry.


Haohai Titanium Oxide (TiOx) Sputtering Targets include Titanium Oxide (TiOx) rotary sputtering targets.




Titanium Oxide (TiOx) Rotatable (Rotary, Cylindrical) Sputtering Target

 

Manufacturing Range

OD (mm)ID (mm)Length (mm)Custom Made
80 - 16060 - 125100 - 4000

 

Specification

CompositionTiOx
Purity99.6%>
Density4.0 g/cm3
Grain Sizes< 100 micron or on request
Fabrication ProcessesPlasma Spraying, Machining
ShapeStraight, Dog bone
End Types

SCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove, 

Custom Made for SS Backing Tube

SurfaceRa 1.6 micron


Other Specification

 Vapor degreased and demagnetized after final machining.

 ID to be HONED and OD GROUND after raw tube is produced to ensure ID to OD concentricity meets drawing requirements.

 High vacuum tight, leak rate at any location not to exceed 1 x 10-8 STD CC/SEC.

 Sealed in plastic, wrapped in foam to protect, and ends capped to protect seal surfaces.

 


 

Titanium Oxide (TiOx) Rotary sputtering targets

 

Tolerance

Acc. to drawings or on request.

 

Impurities Content [wt%]

Titanium Oxide Content [wt%]
TiOx (x<2)
Purity [%]
99.6 >
Impurities [ppm]Al2O30.03
CaO0.03
Cr2O30.09
Fe2O30.10
MoO30.03
NbO0.03
P2O50.01
SiO20.06
ZrO20.02
Resistivity [ohm.cm] 20℃< 0.1
Guaranteed Density [g/cm3]4.0
Grain Size [μm]100


Application

Large Area Glass Coating

 Display Industry

Optical Coating

 



Haohai Metal (Haohai Titanium), equipped with professional factory, is one of the leading manufacturers and suppliers for various materials and sizes of sputtering targets. Our TiOx sputtering target, with high purity, include bonding or spayed (straight or dogbone) rotatable (rotary, cylindrical) targets, planar (rectangle, disc) targets, which are extensiely used in pvd coating for thin film deposition technology. Welcome to buy and wholesale our low price, high usage rates, high purity and high quality TiOx targets.

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